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282-nm AlGaN-based deep ultraviolet light-emitting diodes with improved performance on nano-patterned sapphire substrates

We first report AlGaN-based deep ultraviolet light-emitting diodes (UV-LEDs) grown on nano-patterned sapphire substrates (NPSS) prepared through a nanosphere lithography technique. The AlN coalescence thickness on NPSS is only 3 μm due to AlN's nano-scaled lateral growth, which also leads to lo...

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Published in:Applied physics letters 2013-06, Vol.102 (24)
Main Authors: Dong, Peng, Yan, Jianchang, Wang, Junxi, Zhang, Yun, Geng, Chong, Wei, Tongbo, Cong, Peipei, Zhang, Yiyun, Zeng, Jianping, Tian, Yingdong, Sun, Lili, Yan, Qingfeng, Li, Jinmin, Fan, Shunfei, Qin, Zhixin
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cited_by cdi_FETCH-LOGICAL-c229t-2af5ca9d434a4f0e4956038bee99d8d94b210d5345256684e543d1d79ca27d413
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container_issue 24
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container_title Applied physics letters
container_volume 102
creator Dong, Peng
Yan, Jianchang
Wang, Junxi
Zhang, Yun
Geng, Chong
Wei, Tongbo
Cong, Peipei
Zhang, Yiyun
Zeng, Jianping
Tian, Yingdong
Sun, Lili
Yan, Qingfeng
Li, Jinmin
Fan, Shunfei
Qin, Zhixin
description We first report AlGaN-based deep ultraviolet light-emitting diodes (UV-LEDs) grown on nano-patterned sapphire substrates (NPSS) prepared through a nanosphere lithography technique. The AlN coalescence thickness on NPSS is only 3 μm due to AlN's nano-scaled lateral growth, which also leads to low dislocation densities in AlN and epi-layers above. On NPSS, the light-output power of a 282-nm UV-LED reaches 3.03 mW at 20 mA with external quantum efficiency of 3.45%, exhibiting 98% better performance than that on flat sapphire. Temperature-dependent photoluminescence reveals this significant enhancement to be a combination of higher internal quantum efficiency and higher light extraction efficiency.
doi_str_mv 10.1063/1.4812237
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title 282-nm AlGaN-based deep ultraviolet light-emitting diodes with improved performance on nano-patterned sapphire substrates
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