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282-nm AlGaN-based deep ultraviolet light-emitting diodes with improved performance on nano-patterned sapphire substrates
We first report AlGaN-based deep ultraviolet light-emitting diodes (UV-LEDs) grown on nano-patterned sapphire substrates (NPSS) prepared through a nanosphere lithography technique. The AlN coalescence thickness on NPSS is only 3 μm due to AlN's nano-scaled lateral growth, which also leads to lo...
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Published in: | Applied physics letters 2013-06, Vol.102 (24) |
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container_issue | 24 |
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container_title | Applied physics letters |
container_volume | 102 |
creator | Dong, Peng Yan, Jianchang Wang, Junxi Zhang, Yun Geng, Chong Wei, Tongbo Cong, Peipei Zhang, Yiyun Zeng, Jianping Tian, Yingdong Sun, Lili Yan, Qingfeng Li, Jinmin Fan, Shunfei Qin, Zhixin |
description | We first report AlGaN-based deep ultraviolet light-emitting diodes (UV-LEDs) grown on nano-patterned sapphire substrates (NPSS) prepared through a nanosphere lithography technique. The AlN coalescence thickness on NPSS is only 3 μm due to AlN's nano-scaled lateral growth, which also leads to low dislocation densities in AlN and epi-layers above. On NPSS, the light-output power of a 282-nm UV-LED reaches 3.03 mW at 20 mA with external quantum efficiency of 3.45%, exhibiting 98% better performance than that on flat sapphire. Temperature-dependent photoluminescence reveals this significant enhancement to be a combination of higher internal quantum efficiency and higher light extraction efficiency. |
doi_str_mv | 10.1063/1.4812237 |
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title | 282-nm AlGaN-based deep ultraviolet light-emitting diodes with improved performance on nano-patterned sapphire substrates |
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