Competitive Si and La effect in HfO2 phase stabilization in multi-layer (La2O3)0.08(HfO2) films

The effect of Si diffusion in HfO2 and the presence of La on phase transformation were investigated. Tetragonal HfO2 structures exhibited high permittivity, and the addition of exotic atoms to HfO2 facilitated tetragonal phase transformation. In multi-layer (La2O3)0.08(HfO2) films, the top HfO2 laye...

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Bibliographic Details
Published in:Applied physics letters 2013-08, Vol.103 (8)
Main Authors: Cao, Duo, Cheng, Xinhong, Yu, Yuehui, Li, Xiaolong, Liu, Chunze, Shen, Dashen, Mändl, Stephan
Format: Article
Language:English
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Summary:The effect of Si diffusion in HfO2 and the presence of La on phase transformation were investigated. Tetragonal HfO2 structures exhibited high permittivity, and the addition of exotic atoms to HfO2 facilitated tetragonal phase transformation. In multi-layer (La2O3)0.08(HfO2) films, the top HfO2 layer was transformed into a perfect tetragonal structure, and the bottom HfO2 layer near the interfacial layer was of a cubic structure, after annealing at 800 °C. The permittivity reached 50–60. Si diffusion into the HfO2 film stabilized the tetragonal structure, and La incorporation into HfO2 facilitated the transition of the cubic structure.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4819198