In-situ local temperature measurement during three-dimensional direct laser writing

We present an approach to measure in situ the local temperature increase in the exposed volume during three-dimensional direct laser writing. The method is based on the detection of luminescence from NaYF4:Yb3+, Er3+ co-doped nanocrystals in a confocal scheme. We found the temperature increase to be...

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Bibliographic Details
Published in:Applied physics letters 2013-09, Vol.103 (12)
Main Authors: Mueller, Jonathan B., Fischer, Joachim, Mange, Yatin J., Nann, Thomas, Wegener, Martin
Format: Article
Language:English
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Summary:We present an approach to measure in situ the local temperature increase in the exposed volume during three-dimensional direct laser writing. The method is based on the detection of luminescence from NaYF4:Yb3+, Er3+ co-doped nanocrystals in a confocal scheme. We found the temperature increase to be below a few K within the normal writing regime. If the photoresist is overexposed, significant temperature changes of several hundred K can be observed.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4821556