Defects, stoichiometry, and electronic transport in SrTiO3-δ epilayers: A high pressure oxygen sputter deposition study

• Published in: Journal of applied physics 2016-08, Vol.120 (5)
• Main Authors: Ambwani, P., Xu, P., Haugstad, G., Jeong, J. S., Deng, R., Mkhoyan, K. A., Jalan, B., Leighton, C.
• Format: Article
• Language: English
• Subjects: Applied physics; Bulk density; Carrier density; Crystal defects; Defects; Dielectric properties; Electron transport; Emission; Heterostructures; High pressure oxygen; Laser beams; Lattice vacancies; Molecular beam epitaxy; Perovskites; Pulsed laser deposition; Pulsed lasers; Sputtering; Stoichiometry; Strontium titanates; Substrates; Thin films; Trace impurities
• ISSN: 0021-8979; 1089-7550
• DOI: 10.1063/1.4960343

SrTiO3 is not only of enduring interest due to its unique dielectric, structural, and lattice dynamical properties, but is also the archetypal perovskite oxide semiconductor and a foundational material in oxide heterostructures and electronics. This has naturally focused attention on growth, stoichiometry, and defects in SrTiO3, one exciting recent development being such precisely stoichiometric defect-managed thin films that electron mobilities have finally exceeded bulk crystals. This has been achieved only by molecular beam epitaxy, however (and to a somewhat lesser extent pulsed laser deposition (PLD)), and numerous open questions remain. Here, we present a study of the stoichiometry, defects, and structure in SrTiO3 synthesized by a different method, high pressure oxygen sputtering, relating the results to electronic transport. We find that this form of sputter deposition is also capable of homoepitaxy of precisely stoichiometric SrTiO3, but only provided that substrate and target preparation, temperature, pressure, and deposition rate are carefully controlled. Even under these conditions, oxygen-vacancy-doped heteroepitaxial SrTiO3 films are found to have carrier density, mobility, and conductivity significantly lower than bulk. While surface depletion plays a role, it is argued from particle-induced X-ray emission (PIXE) measurements of trace impurities in commercial sputtering targets that this is also due to deep acceptors such as Fe at 100's of parts-per-million levels. Comparisons of PIXE from SrTiO3 crystals and polycrystalline targets are shown to be of general interest, with clear implications for sputter and PLD deposition of this important material.