Diagnostics of microwave assisted electron cyclotron resonance plasma source for surface modification of nylon 6

• Published in: Review of scientific instruments 2018-01, Vol.89 (1), p.013509-013509
• Main Authors: More, Supriya E., Das, Partha Sarathi, Bansode, Avinash, Dhamale, Gayatri, Ghorui, S., Bhoraskar, S. V., Sahasrabudhe, S. N., Mathe, Vikas L.
• Format: Article
• Language: English
• Subjects: Cyclotron resonance; Diagnostic systems; Distribution functions; Electron cyclotron resonance; Electron density; Electron energy; Electron energy distribution; Hydrophobicity; Morphology; Nitrogen plasma; Nylon 6; Organic chemistry; Oxygen plasma; Parameters; Plasma; Plasma processing; Scientific apparatus & instruments; Sputtering
• ISSN: 0034-6748; 1089-7623
• DOI: 10.1063/1.4991585

Looking at the increasing scope of plasma processing of materials surface, here we present the development and diagnostics of a microwave assisted Electron Cyclotron Resonance (ECR) plasma system suitable for surface modification of polymers. Prior to the surface-treatment, a detailed diagnostic mapping of the plasma parameters throughout the reactor chamber was carried out by using single and double Langmuir probe measurements in Ar plasma. Conventional analysis of I-V curves as well as the elucidation form of the Electron Energy Distribution Function (EEDF) has become the source of calibration of plasma parameters in the reaction chamber. The high energy tail in the EEDF of electron temperature is seen to extend beyond 60 eV, at much larger distances from the ECR zone. This proves the suitability of the rector for plasma processing, since the electron energy is much beyond the threshold energy of bond breaking in most of the polymers. Nylon 6 is used as a representative candidate for surface processing in the presence of Ar, H2 + N2, and O2 plasma, treated at different locations inside the plasma chamber. In a typical case, the work of adhesion is seen to almost get doubled when treated with oxygen plasma. Morphology of the plasma treated surface and its hydrophilicity are discussed in view of the variation in electron density and electron temperature at these locations. Nano-protrusions arising from plasma treatment are set to be responsible for the hydrophobicity. Chemical sputtering and physical sputtering are seen to influence the surface morphology on account of sufficient electron energies and increased plasma potential.