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Polytype control of MoS2 using chemical bath deposition
Molybdenum disulfide (MoS2) has a wide range of applications from electronics to catalysis. While the properties of single-layer and multilayer MoS2 films are well understood, controlling the deposited MoS2 polytype remains a significant challenge. In this work, we employ chemical bath deposition, a...
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| Published in: | The Journal of chemical physics 2019-05, Vol.150 (17), p.174701-174701 |
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| Main Authors: | , |
| Format: | Article |
| Language: | English |
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| cited_by | cdi_FETCH-LOGICAL-c262t-385829b25f41d30bf79d6b58c154f4d487f53076b402648e7d0296aca8a62af53 |
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| cites | cdi_FETCH-LOGICAL-c262t-385829b25f41d30bf79d6b58c154f4d487f53076b402648e7d0296aca8a62af53 |
| container_end_page | 174701 |
| container_issue | 17 |
| container_start_page | 174701 |
| container_title | The Journal of chemical physics |
| container_volume | 150 |
| creator | Hedlund, Jenny K. Walker, Amy V. |
| description | Molybdenum disulfide (MoS2) has a wide range of applications from electronics
to catalysis. While the properties of single-layer and multilayer MoS2 films
are well understood, controlling the deposited MoS2 polytype remains a
significant challenge. In this work, we employ chemical bath deposition, an aqueous
deposition technique, to deposit large area MoS2 thin films at room
temperature. Using Raman spectroscopy and x-ray photoelectron spectroscopy, we show that
the deposited MoS2 polytype can be changed from semiconducting 2H
MoS2 on hydrophobic –CH3 and
–CO2C6F5 terminated self-assembled monolayers (SAMs) to
semimetallic 1T MoS2 on hydrophilic –OH and –COOH terminated SAMs. The data
suggest that the deposition of MoS2 polytypes is controlled by the substrate
surface energy. High surface energy substrates stabilize 1T MoS2 films, while
2H MoS2 is deposited on lower surface energy substrates. This effect appears to
be general enabling the deposition of different MoS2 polytypes on a wide range
of substrates. |
| doi_str_mv | 10.1063/1.5089661 |
| format | article |
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to catalysis. While the properties of single-layer and multilayer MoS2 films
are well understood, controlling the deposited MoS2 polytype remains a
significant challenge. In this work, we employ chemical bath deposition, an aqueous
deposition technique, to deposit large area MoS2 thin films at room
temperature. Using Raman spectroscopy and x-ray photoelectron spectroscopy, we show that
the deposited MoS2 polytype can be changed from semiconducting 2H
MoS2 on hydrophobic –CH3 and
–CO2C6F5 terminated self-assembled monolayers (SAMs) to
semimetallic 1T MoS2 on hydrophilic –OH and –COOH terminated SAMs. The data
suggest that the deposition of MoS2 polytypes is controlled by the substrate
surface energy. High surface energy substrates stabilize 1T MoS2 films, while
2H MoS2 is deposited on lower surface energy substrates. This effect appears to
be general enabling the deposition of different MoS2 polytypes on a wide range
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to catalysis. While the properties of single-layer and multilayer MoS2 films
are well understood, controlling the deposited MoS2 polytype remains a
significant challenge. In this work, we employ chemical bath deposition, an aqueous
deposition technique, to deposit large area MoS2 thin films at room
temperature. Using Raman spectroscopy and x-ray photoelectron spectroscopy, we show that
the deposited MoS2 polytype can be changed from semiconducting 2H
MoS2 on hydrophobic –CH3 and
–CO2C6F5 terminated self-assembled monolayers (SAMs) to
semimetallic 1T MoS2 on hydrophilic –OH and –COOH terminated SAMs. The data
suggest that the deposition of MoS2 polytypes is controlled by the substrate
surface energy. High surface energy substrates stabilize 1T MoS2 films, while
2H MoS2 is deposited on lower surface energy substrates. This effect appears to
be general enabling the deposition of different MoS2 polytypes on a wide range
of substrates.</description><issn>0021-9606</issn><issn>1089-7690</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNp90E1LAzEQBuAgCtbqwX-QowpbJ9ndfBxF_IKKgnoO2WxiI9vNmqRC_71bWvQgeJkZmIeBeRE6JTAjwMpLMqtBSMbIHpqQcSo4k7CPJgCUFJIBO0RHKX0AAOG0miD-HLp1Xg8Wm9DnGDocHH4MLxSvku_fsVnYpTe6w43OC9zaISSffeiP0YHTXbInuz5Fb7c3r9f3xfzp7uH6al4YymguSlELKhtau4q0JTSOy5Y1tTCkrlzVVoK7ugTOmgooq4TlLVDJtNFCM6rH3RSdbe8OMXyubMpq6ZOxXad7G1ZJUVoSWXI-lik631ITQ0rROjVEv9RxrQioTTiKqF04o73Y2mR81puHfvBXiL9QDa37D_-9_A27e3Df</recordid><startdate>20190507</startdate><enddate>20190507</enddate><creator>Hedlund, Jenny K.</creator><creator>Walker, Amy V.</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><orcidid>https://orcid.org/0000-0003-2114-3644</orcidid></search><sort><creationdate>20190507</creationdate><title>Polytype control of MoS2 using chemical bath deposition</title><author>Hedlund, Jenny K. ; Walker, Amy V.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c262t-385829b25f41d30bf79d6b58c154f4d487f53076b402648e7d0296aca8a62af53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Hedlund, Jenny K.</creatorcontrib><creatorcontrib>Walker, Amy V.</creatorcontrib><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>The Journal of chemical physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hedlund, Jenny K.</au><au>Walker, Amy V.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Polytype control of MoS2 using chemical bath deposition</atitle><jtitle>The Journal of chemical physics</jtitle><date>2019-05-07</date><risdate>2019</risdate><volume>150</volume><issue>17</issue><spage>174701</spage><epage>174701</epage><pages>174701-174701</pages><issn>0021-9606</issn><eissn>1089-7690</eissn><coden>JCPSA6</coden><abstract>Molybdenum disulfide (MoS2) has a wide range of applications from electronics
to catalysis. While the properties of single-layer and multilayer MoS2 films
are well understood, controlling the deposited MoS2 polytype remains a
significant challenge. In this work, we employ chemical bath deposition, an aqueous
deposition technique, to deposit large area MoS2 thin films at room
temperature. Using Raman spectroscopy and x-ray photoelectron spectroscopy, we show that
the deposited MoS2 polytype can be changed from semiconducting 2H
MoS2 on hydrophobic –CH3 and
–CO2C6F5 terminated self-assembled monolayers (SAMs) to
semimetallic 1T MoS2 on hydrophilic –OH and –COOH terminated SAMs. The data
suggest that the deposition of MoS2 polytypes is controlled by the substrate
surface energy. High surface energy substrates stabilize 1T MoS2 films, while
2H MoS2 is deposited on lower surface energy substrates. This effect appears to
be general enabling the deposition of different MoS2 polytypes on a wide range
of substrates.</abstract><doi>10.1063/1.5089661</doi><tpages>8</tpages><orcidid>https://orcid.org/0000-0003-2114-3644</orcidid></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0021-9606 |
| ispartof | The Journal of chemical physics, 2019-05, Vol.150 (17), p.174701-174701 |
| issn | 0021-9606 1089-7690 |
| language | eng |
| recordid | cdi_crossref_primary_10_1063_1_5089661 |
| source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list); American Institute of Physics |
| title | Polytype control of MoS2 using chemical bath deposition |
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