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Piezoresistive behavior of amorphous carbon films for high performance MEMS force sensors
In this study, microelectromechanical systems (MEMS) force sensors based on H-free amorphous carbon (a-C) films with controlled piezoresistive behavior were fabricated by a facile magnetron sputtering technique. By adjusting the substrate bias voltage from 0 V (floating state) to –350 V, the gauge f...
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Published in: | Applied physics letters 2019-06, Vol.114 (25) |
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creator | Ma, Xin Guo, Peng Tong, Xiaoshan Zhao, Yulong Zhang, Qi Ke, Peiling Wang, Aiying |
description | In this study, microelectromechanical systems (MEMS) force sensors based on H-free amorphous carbon (a-C) films with controlled piezoresistive behavior were fabricated by a facile magnetron sputtering technique. By adjusting the substrate bias voltage from 0 V (floating state) to –350 V, the gauge factor (GF) of the a-C film was modulated in the range of 1.4–12.1. Interestingly, the GF showed a strong dependence on the sp2 content and the sp2 cluster size of the film, which was consistent with the theory of thick film resistors. In addition, the sensitivity of a-C based MEMS force sensors reached 80.7 μV/V/N in the force range of 0–1.16 N, with a nonlinearity of approximately 1.3% full scale and good repeatability in over 5000 test cycles. |
doi_str_mv | 10.1063/1.5096225 |
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source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list); American Institute of Physics |
subjects | Applied physics Carbon Dependence Magnetron sputtering Microelectromechanical systems Resistors Sensors Substrates |
title | Piezoresistive behavior of amorphous carbon films for high performance MEMS force sensors |
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