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Direct observation of an enhanced concentration of the principal deep level EL2 at single dislocations
Regions of low dislocation density (∼5×102 cm−2) in 2-mm-thick {001} wafers from indium doped, liquid encapsulated Czochralski grown, 2-in-diam. GaAs ingots have been examined by transmission infrared microscopy. Discrete dislocations were located and identified by their etching behavior in the cali...
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Published in: | Applied physics letters 1985-06, Vol.46 (11), p.1066-1068 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Regions of low dislocation density (∼5×102 cm−2) in 2-mm-thick {001} wafers from indium doped, liquid encapsulated Czochralski grown, 2-in-diam. GaAs ingots have been examined by transmission infrared microscopy. Discrete dislocations were located and identified by their etching behavior in the calibrated A/B etchant. Comparison of identical regions before and after etching showed that increased absorption at 1 μm occurred at the sites of each dislocation. The results demonstrate directly that enhancement of [EL2], the concentration of the deep donor level EL2, occurs at single dislocations. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.95762 |