Loading…

Differential surface photovoltage measurement of minority-carrier diffusion length in thin films

A new surface photovoltage technique is introduced for the determination of the minority-carrier diffusion length in thin semiconductor films. The technique eliminates the effect of a back surface barrier on the measurement by separating out the back barrier contribution to the total photovoltage si...

Full description

Saved in:
Bibliographic Details
Published in:Applied physics letters 1985-01, Vol.47 (7), p.740-742
Main Authors: SCHWARZ, R, SLOBODIN, D, WAGNER, S
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-c281t-1f67c3a6a2540952ca897c4aeaee1ef903b310271558b31de6ff14a1e5e8143a3
cites cdi_FETCH-LOGICAL-c281t-1f67c3a6a2540952ca897c4aeaee1ef903b310271558b31de6ff14a1e5e8143a3
container_end_page 742
container_issue 7
container_start_page 740
container_title Applied physics letters
container_volume 47
creator SCHWARZ, R
SLOBODIN, D
WAGNER, S
description A new surface photovoltage technique is introduced for the determination of the minority-carrier diffusion length in thin semiconductor films. The technique eliminates the effect of a back surface barrier on the measurement by separating out the back barrier contribution to the total photovoltage signal. With a direct difference method based on a double lock-in technique, the measurement can be carried out in a single run.
doi_str_mv 10.1063/1.96023
format article
fullrecord <record><control><sourceid>pascalfrancis_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_96023</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>8798018</sourcerecordid><originalsourceid>FETCH-LOGICAL-c281t-1f67c3a6a2540952ca897c4aeaee1ef903b310271558b31de6ff14a1e5e8143a3</originalsourceid><addsrcrecordid>eNqFkE1LAzEQhoMoWKv4F3IQPG3NbDab7FGqVaHgRc_rmE7ayH6UJBX6741WvHqZmXd4eA4vY5cgZiBqeQOzphalPGITEFoXEsAcs4kQQhZ1o-CUncX4kaMqpZywtzvvHAUakseOx11waIlvN2MaP8cu4Zp4T5j_1GeGj473fhiDT_vCYgieAl9lwy76ceAdDeu04X7gaZOH810fz9mJwy7Sxe-estfF_cv8sVg-PzzNb5eFLQ2kAlytrcQaS1WJRpUWTaNthYREQK4R8l2CKDUoZfK1oto5qBBIkYFKopyy64PXhjHGQK7dBt9j2Lcg2u9iWmh_isnk1YHcYrTYuYCD9fEPN7oxAsx_mG60ktn2BQ4scCo</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Differential surface photovoltage measurement of minority-carrier diffusion length in thin films</title><source>AIP Digital Archive</source><creator>SCHWARZ, R ; SLOBODIN, D ; WAGNER, S</creator><creatorcontrib>SCHWARZ, R ; SLOBODIN, D ; WAGNER, S</creatorcontrib><description>A new surface photovoltage technique is introduced for the determination of the minority-carrier diffusion length in thin semiconductor films. The technique eliminates the effect of a back surface barrier on the measurement by separating out the back barrier contribution to the total photovoltage signal. With a direct difference method based on a double lock-in technique, the measurement can be carried out in a single run.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.96023</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>Melville, NY: American Institute of Physics</publisher><subject>Applied sciences ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Electronic transport in condensed matter ; Exact sciences and technology ; Other techniques and industries ; Photoconduction and photovoltaic effects; photodielectric effects ; Physics</subject><ispartof>Applied physics letters, 1985-01, Vol.47 (7), p.740-742</ispartof><rights>1987 INIST-CNRS</rights><rights>1986 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c281t-1f67c3a6a2540952ca897c4aeaee1ef903b310271558b31de6ff14a1e5e8143a3</citedby><cites>FETCH-LOGICAL-c281t-1f67c3a6a2540952ca897c4aeaee1ef903b310271558b31de6ff14a1e5e8143a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=7975323$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=8798018$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>SCHWARZ, R</creatorcontrib><creatorcontrib>SLOBODIN, D</creatorcontrib><creatorcontrib>WAGNER, S</creatorcontrib><title>Differential surface photovoltage measurement of minority-carrier diffusion length in thin films</title><title>Applied physics letters</title><description>A new surface photovoltage technique is introduced for the determination of the minority-carrier diffusion length in thin semiconductor films. The technique eliminates the effect of a back surface barrier on the measurement by separating out the back barrier contribution to the total photovoltage signal. With a direct difference method based on a double lock-in technique, the measurement can be carried out in a single run.</description><subject>Applied sciences</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Electronic transport in condensed matter</subject><subject>Exact sciences and technology</subject><subject>Other techniques and industries</subject><subject>Photoconduction and photovoltaic effects; photodielectric effects</subject><subject>Physics</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1985</creationdate><recordtype>article</recordtype><recordid>eNqFkE1LAzEQhoMoWKv4F3IQPG3NbDab7FGqVaHgRc_rmE7ayH6UJBX6741WvHqZmXd4eA4vY5cgZiBqeQOzphalPGITEFoXEsAcs4kQQhZ1o-CUncX4kaMqpZywtzvvHAUakseOx11waIlvN2MaP8cu4Zp4T5j_1GeGj473fhiDT_vCYgieAl9lwy76ceAdDeu04X7gaZOH810fz9mJwy7Sxe-estfF_cv8sVg-PzzNb5eFLQ2kAlytrcQaS1WJRpUWTaNthYREQK4R8l2CKDUoZfK1oto5qBBIkYFKopyy64PXhjHGQK7dBt9j2Lcg2u9iWmh_isnk1YHcYrTYuYCD9fEPN7oxAsx_mG60ktn2BQ4scCo</recordid><startdate>19850101</startdate><enddate>19850101</enddate><creator>SCHWARZ, R</creator><creator>SLOBODIN, D</creator><creator>WAGNER, S</creator><general>American Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19850101</creationdate><title>Differential surface photovoltage measurement of minority-carrier diffusion length in thin films</title><author>SCHWARZ, R ; SLOBODIN, D ; WAGNER, S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c281t-1f67c3a6a2540952ca897c4aeaee1ef903b310271558b31de6ff14a1e5e8143a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1985</creationdate><topic>Applied sciences</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Electronic transport in condensed matter</topic><topic>Exact sciences and technology</topic><topic>Other techniques and industries</topic><topic>Photoconduction and photovoltaic effects; photodielectric effects</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>SCHWARZ, R</creatorcontrib><creatorcontrib>SLOBODIN, D</creatorcontrib><creatorcontrib>WAGNER, S</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>SCHWARZ, R</au><au>SLOBODIN, D</au><au>WAGNER, S</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Differential surface photovoltage measurement of minority-carrier diffusion length in thin films</atitle><jtitle>Applied physics letters</jtitle><date>1985-01-01</date><risdate>1985</risdate><volume>47</volume><issue>7</issue><spage>740</spage><epage>742</epage><pages>740-742</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>A new surface photovoltage technique is introduced for the determination of the minority-carrier diffusion length in thin semiconductor films. The technique eliminates the effect of a back surface barrier on the measurement by separating out the back barrier contribution to the total photovoltage signal. With a direct difference method based on a double lock-in technique, the measurement can be carried out in a single run.</abstract><cop>Melville, NY</cop><pub>American Institute of Physics</pub><doi>10.1063/1.96023</doi><tpages>3</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0003-6951
ispartof Applied physics letters, 1985-01, Vol.47 (7), p.740-742
issn 0003-6951
1077-3118
language eng
recordid cdi_crossref_primary_10_1063_1_96023
source AIP Digital Archive
subjects Applied sciences
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Electronic transport in condensed matter
Exact sciences and technology
Other techniques and industries
Photoconduction and photovoltaic effects
photodielectric effects
Physics
title Differential surface photovoltage measurement of minority-carrier diffusion length in thin films
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T17%3A36%3A27IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Differential%20surface%20photovoltage%20measurement%20of%20minority-carrier%20diffusion%20length%20in%20thin%20films&rft.jtitle=Applied%20physics%20letters&rft.au=SCHWARZ,%20R&rft.date=1985-01-01&rft.volume=47&rft.issue=7&rft.spage=740&rft.epage=742&rft.pages=740-742&rft.issn=0003-6951&rft.eissn=1077-3118&rft.coden=APPLAB&rft_id=info:doi/10.1063/1.96023&rft_dat=%3Cpascalfrancis_cross%3E8798018%3C/pascalfrancis_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c281t-1f67c3a6a2540952ca897c4aeaee1ef903b310271558b31de6ff14a1e5e8143a3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true