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Erbium doping of molecular beam epitaxial GaAs
The doping of molecular beam epitaxial GaAs with erbium up to a concentration of 2×1019 cm−3 has been successfully demonstrated. Up to a concentration of about 5×1018 cm−3 the surface morphology remained good but for higher doping levels the surface became structured. Hall and profile measurements i...
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Published in: | Applied physics letters 1987-01, Vol.50 (1), p.49-51 |
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cites | cdi_FETCH-LOGICAL-c353t-9142e4ba6fce8b1e8249ab9a068e30ce54ee9f1b68489d1a03fc5d89bc4f051f3 |
container_end_page | 51 |
container_issue | 1 |
container_start_page | 49 |
container_title | Applied physics letters |
container_volume | 50 |
creator | SMITH, R. S MÜLLER, H. D ENNEN, H WENNEKERS, P MAIER, M |
description | The doping of molecular beam epitaxial GaAs with erbium up to a concentration of 2×1019 cm−3 has been successfully demonstrated. Up to a concentration of about 5×1018 cm−3 the surface morphology remained good but for higher doping levels the surface became structured. Hall and profile measurements indicate that erbium doping gives rise to a trapping level capable of compensating silicon-doped layers. For the first time photoluminescence from a rare earth element incorporated in a III-V semiconductor has been observed at room temperature. |
doi_str_mv | 10.1063/1.98127 |
format | article |
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issn | 0003-6951 1077-3118 |
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source | AIP Digital Archive |
subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Exact sciences and technology Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Photoluminescence Physics |
title | Erbium doping of molecular beam epitaxial GaAs |
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