Morphology and chemical state of platinum ions implanted into glassy carbon substrates

Glassy carbon substrates were implanted with 100 keV platinum ions. The implanted samples were analyzed using cross-sectional transmission electron microscopy (TEM) and x-ray photoelectron spectroscopy. Ion beam sputtering significantly affected the depth profile during platinum-ion implantation. Cr...

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Bibliographic Details
Published in:Journal of applied physics 2022-11, Vol.132 (17)
Main Authors: Kimata, Tetsuya, Kato, Sho, Kobayashi, Tomohiro, Yamamoto, Shunya, Yamaki, Tetsuya, Terai, Takayuki
Format: Article
Language:English
Subjects:
Cross-sections
Crystal defects
Depth profiling
Electron transfer
Glassy carbon
Ion beam sputtering
Ion implantation
Photoelectrons
Platinum
Substrates
Transmission electron microscopy
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Summary:Glassy carbon substrates were implanted with 100 keV platinum ions. The implanted samples were analyzed using cross-sectional transmission electron microscopy (TEM) and x-ray photoelectron spectroscopy. Ion beam sputtering significantly affected the depth profile during platinum-ion implantation. Cross-sectional TEM revealed that the implanted platinum atoms were in the amorphous state and did not aggregate. Chemical state analysis of the platinum-ion-implanted glassy carbon substrates suggested that lattice defects in the substrates owing to the platinum-ion implantation caused the platinum–carbon interaction with electron transfer from platinum to carbon.
ISSN:0021-8979
1089-7550
DOI:10.1063/5.0103520