Obtaining plasma parameters by Langmuir probes and optical emission spectroscopy in low-pressure DC plasma

The plasma environment in low-pressure systems allows coating different materials such as glasses, textiles, metals, etc. at the atomic level. Although vacuum coating is one of the best methods for thin film coating, the coating quality is closely affected by the spatial and temporal non-uniformitie...

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Bibliographic Details
Published in:Radiation effects and defects in solids 2023-07, Vol.178 (7-8), p.912-928
Main Authors: Senturk, Kenan, Sen, Tuba, Coruhlu, Turgay, Shahzad, Aamir, Aslan, Necdet
Format: Article
Language:English
Subjects:
Coating
Electron density
Electron energy
Electrons
Emission spectroscopy
Ion density (concentration)
Langmuir probe
Low pressure
low pressure DC plasma parameters
Mathematical analysis
multiple Langmuir probe array
Optical emission spectroscopy
Parameters
Plasma
Process control
Process controls
Reaction mechanisms
Spectrum analysis
Temperature distribution
Textiles
Thin film coatings
Thin films
Vacuum chambers
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Summary:The plasma environment in low-pressure systems allows coating different materials such as glasses, textiles, metals, etc. at the atomic level. Although vacuum coating is one of the best methods for thin film coating, the coating quality is closely affected by the spatial and temporal non-uniformities inside the reactor. Therefore it is quite important to determine the plasma properties within the chamber. The determination of plasma parameters such as electron temperature, electron excitation temperature, electron and ion densities can be realized using Langmuir probe systems, and by Optical Emission Spectroscopy (OES) by using Boltzmann plot method. Knowing such parameters can provide important information about specific reaction mechanisms, as well as it provides invaluable information that can increase reproducibility in various discharge process control in thin film coating. In this study, a homemade single Langmuir probe (s-LP) and a multiple Langmuir probe system (m-LP) were used to calculate electron temperature, electron density, saturation current, and plasma potential of the plasma at different pressures and at different voltages. One of the objectives of this work was to evaluate the electron temperature and ion density inside the plasma during a coating process. The second objective was to find the spatial change of electron temperature in the axial direction between cathode and anode by m-LP system including 8 independent tips. The last objective was to measure the axial plasma electron temperature distribution inside the vacuum chamber by using OES.
ISSN:1042-0150
1029-4953
DOI:10.1080/10420150.2023.2195653