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RF/Analog Performance of Novel Junctionless Vertical MOSFETs
In this paper, we analyze the radio frequency (RF) performance for novel junctionless vertical MOSFETs (JLVMOS) with different thicknesses of silicon pillar (T Si = 5, 10 nm). In addition, a junctionless planar SOI MOSFET is also designed for the comparison in this work. According to the numerical s...
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Published in: | Integrated ferroelectrics 2011-01, Vol.129 (1), p.45-51 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | In this paper, we analyze the radio frequency (RF) performance for novel junctionless vertical MOSFETs (JLVMOS) with different thicknesses of silicon pillar (T
Si
= 5, 10 nm). In addition, a junctionless planar SOI MOSFET is also designed for the comparison in this work. According to the numerical simulations, the JLVMOS of T
Si
= 5 nm gets the highest in g
m
and g
m
/I
DS
, but the T
Si
= 10 nm one gets the highest in A
VI
. Moreover, due to the double-gate (DG) structure of the VMOS, it can increase the gate controllability over the channel region. |
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ISSN: | 1058-4587 1607-8489 |
DOI: | 10.1080/10584587.2011.576899 |