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The integration of Ba 0.5 Sr 0.5 TiO 3 with silicon by the use of metallic buffers

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Bibliographic Details
Published in:Integrated ferroelectrics 1998-09, Vol.21 (1-4), p.167-172
Main Authors: Zhuang, W. W., Wu, N. J., Ritums, D., Ignatiev, A.
Format: Article
Language:English
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ISSN:1058-4587
1607-8489
DOI:10.1080/10584589808202060