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Influence of co-sputtering AlB 2 to TaB 2 on stoichiometry of non-reactively sputtered boride thin films

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Bibliographic Details
Published in:	Materials research letters 2024-08, Vol.12 (8), p.561-570
Main Authors:	Hu, Chun, Lin, Shuyao, Podsednik, M., Mráz, Stanislav, Wojcik, T., Limbeck, A., Koutná, Nikola, Mayrhofer, Paul H.
Format:	Article
Language:	English
Citations:	Items that this one cites
Online Access:	Get full text
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