Influence of co-sputtering AlB 2 to TaB 2 on stoichiometry of non-reactively sputtered boride thin films

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Published in:Materials research letters 2024-08, Vol.12 (8), p.561-570
Main Authors: Hu, Chun, Lin, Shuyao, Podsednik, M., Mráz, Stanislav, Wojcik, T., Limbeck, A., Koutná, Nikola, Mayrhofer, Paul H.
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container_issue 8
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container_title Materials research letters
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creator Hu, Chun
Lin, Shuyao
Podsednik, M.
Mráz, Stanislav
Wojcik, T.
Limbeck, A.
Koutná, Nikola
Mayrhofer, Paul H.
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doi_str_mv 10.1080/21663831.2024.2357700
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title Influence of co-sputtering AlB 2 to TaB 2 on stoichiometry of non-reactively sputtered boride thin films
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