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Interface analysis of HfO 2 films on (1 0 0)Si using x-ray photoelectron spectroscopy

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Bibliographic Details
Published in:	Journal of physics. D, Applied physics Applied physics, 2009-02, Vol.42 (3), p.35308
Main Authors:	Sokolov, A A, Filatova, E O, Afanas'ev, V V, Taracheva, E Yu, Brzhezinskaya, M M, Ovchinnikov, A A
Format:	Article
Language:	English
Citations:	Items that this one cites Items that cite this one
Online Access:	Get full text
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