Cryogenic etching of silicon with SF 6 inductively coupled plasmas: a combined modelling and experimental study

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Bibliographic Details
Published in:Journal of physics. D, Applied physics Applied physics, 2015-04, Vol.48 (15), p.155204
Main Authors: Tinck, Stefan, Tillocher, Thomas, Dussart, Rémi, Bogaerts, Annemie
Format: Article
Language:English
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ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/48/15/155204