Effect of Post-Annealing on Microstructural and Electrical Properties of N+ Ion-Implanted into ZnO:In Films

Saved in:
Bibliographic Details
Published in:Chinese physics letters 2008-03, Vol.25 (3), p.1128-1130
Main Authors: Chun-Yang, Kong, Guo-Ping, Qin, Hai-Bo, Ruan, Mao, Nan, Ren-Jiang, Zhu, Te-Li, Dai
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0256-307X
1741-3540
DOI:10.1088/0256-307X/25/3/087