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Three-Step Growth Optimization of AlN Epilayers by MOCVD

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Bibliographic Details
Published in:Chinese physics letters 2008-06, Vol.25 (6), p.2265-2268
Main Authors: Ming-Zeng, Peng, Li-Wei, Guo, Jie, Zhang, Nai-Sen, Yu, Xue-Liang, Zhu, Jian-Feng, Yan, Bin-Hui, Ge, Hai-Qiang, Jia, Hong, Chen, Jun-Ming, Zhou
Format: Article
Language:English
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ISSN:0256-307X
1741-3540
DOI:10.1088/0256-307X/25/6/094