Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography

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Bibliographic Details
Published in:Semiconductor science and technology 1996-10, Vol.11 (10), p.1450-1455
Main Authors: Jiang, Zhong-Tao, Hong, Seungbum, Kim, Eunah, Bae, Byeong-Soo, No, Kwangsoo, Hwangbo, Chang Kwon, Lim, Sung-Chul, Woo, Sang-Gyun, Koh, Young-Bum
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/11/10/016