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Thermal-annealing-induced effects in chemically deposited cobalt sulphide thin films

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Bibliographic Details
Published in:Semiconductor science and technology 2001-05, Vol.16 (5), p.362-366
Main Author: Eze, F C
Format: Article
Language:English
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/16/5/314