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Concentration profiles of antimony-doped shallow layers in silicon
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Published in: | Semiconductor science and technology 2004-06, Vol.19 (6), p.728-732 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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ISSN: | 0268-1242 1361-6641 |
DOI: | 10.1088/0268-1242/19/6/012 |