PEB bake optimization for process window improvement of mixed iso-dense pattern

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Bibliographic Details
Published in:Semiconductor science and technology 2005-08, Vol.20 (8), p.693-698
Main Authors: Liau, C Y, Lee, C H, Kang, J T, Yoon, S W, Loo, Christopher, Seow, Bertrand, Sheu, W B
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/20/8/007