SiGe wet chemical etchants with high compositional selectivity and low strain sensitivity

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Bibliographic Details
Published in:Semiconductor science and technology 2008-08, Vol.23 (8), p.085021
Main Authors: Stoffel, M, Malachias, A, Merdzhanova, T, Cavallo, F, Isella, G, Chrastina, D, von Känel, H, Rastelli, A, Schmidt, O G
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Physics
Surface treatments
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/23/8/085021