Studies of mist deposition for the formation of quantum dot CdSe films

• Published in: Semiconductor science and technology 2009-10, Vol.24 (10), p.105024-105024 (5)
• Main Authors: Price, S C, Shanmugasundaram, K, Ramani, S, Zhu, T, Zhang, F, Xu, J, Mohney, S E, Zhang, Q, Kshirsagar, A, Ruzyllo, J
• Format: Article
• Language: English
• Subjects: Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties; Physics; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
• ISSN: 0268-1242; 1361-6641
• DOI: 10.1088/0268-1242/24/10/105024

Films of CdSe(ZnS) colloidal nanocrystalline quantum dots (NQDs) were deposited on bare silicon, glass and polymer coated silicon using mist deposition. This effort is a part of an exploratory investigation in which this deposition technique is studied for the first time as a method to form semiconductor NQD films. The process parameters, including deposition time, solution concentration and electric field, were varied to change the thickness of the deposited film. Blanket films and films deposited through a shadow mask were created to investigate the method's ability to pattern films during the deposition process. The differences between these deposition modes in terms of film morphology were observed. Overall, the results show that mist deposition of quantum dots is a viable method for creating thin, patterned quantum dot films using colloidal solution as the precursor. It is concluded that this technique shows very good promise for quantum dot (light emitting diode, LED) fabrication.