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Recent progress in metal-organic chemical vapor deposition of $\left( 000\bar{1} \right)$ N-polar group-III nitrides

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Bibliographic Details
Published in:Semiconductor science and technology 2014-11, Vol.29 (11), p.113001
Main Authors: Keller, Stacia, Li, Haoran, Laurent, Matthew, Hu, Yanling, Pfaff, Nathan, Lu, Jing, Brown, David F, Fichtenbaum, Nicholas A, Speck, James S, DenBaars, Steven P, Mishra, Umesh K
Format: Article
Language:eng ; jpn
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/29/11/113001