Structural properties of amorphous silicon-carbon films deposited by the filtered cathodic vacuum arc technique

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Bibliographic Details
Published in:Journal of physics. Condensed matter 1999-07, Vol.11 (26), p.5111-5118
Main Authors: Shi, J R, Shi, X, Sun, Z, Liu, E, Yang, H S, Cheah, L K, Jin, X Z
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
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ISSN:0953-8984
1361-648X
DOI:10.1088/0953-8984/11/26/312