Atomic nanolithography patterning of submicron features: writing an organic self-assembled monolayer with cold, bright Cs atom beams

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Bibliographic Details
Published in:Nanotechnology 2005-09, Vol.16 (9), p.1536-1541
Main Authors: O’Dwyer, C, Gay, G, Viaris de Lesegno, B, Weiner, J, Camposeo, A, Tantussi, F, Fuso, F, Allegrini, M, Arimondo, E
Format: Article
Language:English
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ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/16/9/022