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Nanoscale (EOT = 5.6 nm) nonvolatile memory characteristics using n-Si/SiO 2 / HfAlO nanocrystal/Al 2 O 3 / Ptcapacitors
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Published in: | Nanotechnology 2008-10, Vol.19 (43), p.435202 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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ISSN: | 0957-4484 1361-6528 |
DOI: | 10.1088/0957-4484/19/43/435202 |