Universal pattern transfer methods for metal nanostructures by block copolymer lithography

A universal block copolymer pattern transfer method was demonstrated to produce Co nanostructures consisting of arrays of lines or dots from a polystyrene-block-polydimethylsiloxane (PS-b-PDMS) diblock copolymer. Three processes were used: liftoff, a damascene process, and ion beam etching using a h...

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Bibliographic Details
Published in:Nanotechnology 2015-09, Vol.26 (37), p.375301-12
Main Authors: Tu, Kun-Hua, Bai, Wubin, Liontos, George, Ntetsikas, Konstantinos, Avgeropoulos, Apostolos, Ross, Caroline A
Format: Article
Language:English
Subjects:
Arrays
block copolymer
Block copolymers
cobalt nanodot
cobalt nanowire
Copolymers
Etching
Ion beams
Liftoff
metal nanostructure
Nanostructure
pattern transfer
PDMS
Production methods
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Summary:A universal block copolymer pattern transfer method was demonstrated to produce Co nanostructures consisting of arrays of lines or dots from a polystyrene-block-polydimethylsiloxane (PS-b-PDMS) diblock copolymer. Three processes were used: liftoff, a damascene process, and ion beam etching using a hard mask of tungsten, including a sacrificial poly(methyl methacrylate) layer under the PS-b-PDMS for the etch and liftoff processes. The ion beam etch process produced the most uniform magnetic arrays. A structural and magnetic comparison in terms of uniformity, edge roughness and switching field distribution has been reported.
ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/26/37/375301