Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements

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Bibliographic Details
Published in:Plasma sources science & technology 2005-05, Vol.14 (2), p.321-328
Main Authors: de Poucques, Ludovic, Imbert, Jean-Christophe, Boisse-Laporte, Caroline, Vasina, Petr, Bretagne, Jean, Teulé-Gay, Lionel, Touzeau, Michel
Format: Article
Language:English
Subjects:
Electric and magnetic measurements
Exact sciences and technology
Optical (ultraviolet, visible, infrared) measurements
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
Plasma diagnostic techniques and instrumentation
Plasma-based ion implantation and deposition
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ISSN:0963-0252
1361-6595
DOI:10.1088/0963-0252/14/2/014