A novel approach for negative ion analysis using 160 GHz microwave interferometry and laser photodetachment in oxygen cc-rf plasmas

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Bibliographic Details
Published in:Plasma sources science & technology 2010-12, Vol.19 (6), p.065011
Main Authors: Küllig, C, Dittmann, K, Meichsner, J
Format: Article
Language:English
Subjects:
Exact sciences and technology
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma diagnostic techniques and instrumentation
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ISSN:0963-0252
1361-6595
DOI:10.1088/0963-0252/19/6/065011