Selective area laser-assisted doping of SiC thin films and blue light electroluminescence

Laser-assisted doping combined with annealing technique is used in selective areas to form a p-n junction on a SiC thin film grown by the pulsed laser deposition on a Si substrate at a temperature of 800 °C. This approach in an aluminum chloride solution and a phosphoric solution has resulted in p-S...

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Bibliographic Details
Published in:Journal of physics. D, Applied physics Applied physics, 2019-11, Vol.52 (48), p.48
Main Authors: Paneerselvam, Emmanuel, Kikuchi, Toshifumi, Ikenoue, Hiroshi, Vasa, Nilesh J, Palani, I A, Higashihata, Mitsuhiro, Nakamura, Daisuke, Ramachandra Rao, M S
Format: Article
Language:English
Subjects:
electroluminescence
laser assisted doping
pulsed laser deposition
selective area doping
SiC thin film
silicon carbide
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Summary:Laser-assisted doping combined with annealing technique is used in selective areas to form a p-n junction on a SiC thin film grown by the pulsed laser deposition on a Si substrate at a temperature of 800 °C. This approach in an aluminum chloride solution and a phosphoric solution has resulted in p-SiC/n-Si and n-SiC/p-Si hetero-structures, respectively. Further, a functional in-plane p-n junction is realized side-by-side on the post-deposited SiC thin film. I-V characteristics by two probe technique showed the p-n diode characteristics. Blue light (400 nm) electroluminescence from the p-n junction on SiC thin film was observed in the forward biased condition. Further, an improvement in the I-V reverse characteristics was observed by illuminating the p-n SiC thin film with green/blue light.
ISSN:0022-3727
1361-6463
DOI:10.1088/1361-6463/ab3e97