Si sputtering yield amplification: a study of the collisions cascade and species in the sputtering plasma

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Bibliographic Details
Published in:Journal of physics. D, Applied physics Applied physics, 2021-09, Vol.54 (37), p.375201
Main Authors: Cruz, J, Sanginés, R, Soto-Valle, G, Muhl, S, Sierra, I, De Lucio-Morales, O, Ruvalcaba, J L, Mitrani, A, Calderón-Olvera, R M, Mendoza-Pérez, R, Machorro-Mejía, R
Format: Article
Language:English
Subjects:
optical emission spectroscopy
sputtering
sputtering yield amplification
thin films
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ISSN:0022-3727
1361-6463
DOI:10.1088/1361-6463/ac0c4e