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Nanocrystalline β-Ga 2 O 3 thin film prepared by electron beam evaporation for enhanced photodetection
In this study, e-beam evaporation technique was used to fabricate thin-film (TF) of β -Ga 2 O 3 on Si-substrate. The average crystallite size was determined to be roughly ∼39.8 nm. The deposition of β -Ga 2 O 3 TF appears smooth and devoid of cracks or pits, with an average film thickness of ∼375 nm...
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Published in: | Journal of physics. D, Applied physics Applied physics, 2023-09, Vol.56 (39), p.395104 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | In this study, e-beam evaporation technique was used to fabricate thin-film (TF) of
β
-Ga
2
O
3
on Si-substrate. The average crystallite size was determined to be roughly ∼39.8 nm. The deposition of
β
-Ga
2
O
3
TF appears smooth and devoid of cracks or pits, with an average film thickness of ∼375 nm. From the ultraviolet (UV)–Vis absorption, the optical bandgap value for
β
-Ga
2
O
3
TF was found to be about ∼4.84 eV. Our study found that the photodetector (PD) had excellent performance, characterized by an extremely low dark current of 4.02 × 10
−8
A at −1 V bias, an
I
L
/
I
D
ratio over nine times, and the short rise and fall times of .27 s and .059 s. The simultaneous achievement of minimal dark current and quick rise and fall times is remarkable. The
β
-Ga
2
O
3
TF PD’s remarkable consistency and reproducibility suggest promising practical applications for UV PDs. |
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ISSN: | 0022-3727 1361-6463 |
DOI: | 10.1088/1361-6463/ace201 |