Nanopatterning by ion beam sputtering in unconventional formats

Nanopatterning at solid surfaces by ion beam sputtering (IBS) has been practiced mostly for stationary substrates with an ion beam incident under a fixed sputter geometry. We have released such constraints in the sputter condition. We simultaneously apply two ion beams or sequentially vary the orien...

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Bibliographic Details
Published in:Journal of physics. Condensed matter 2018-07, Vol.30 (27), p.274004-274004
Main Authors: Kim, J-H, Yoon, S M, Jo, Sujin, Seo, J, Kim, J-S
Format: Article
Language:English
Subjects:
dual ion beam sputtering
ion beam
nanopatterning
rocking during ion beam sputtering
sequential ion beam sputtering
sputtering
swing during ion beam sputtering
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Summary:Nanopatterning at solid surfaces by ion beam sputtering (IBS) has been practiced mostly for stationary substrates with an ion beam incident under a fixed sputter geometry. We have released such constraints in the sputter condition. We simultaneously apply two ion beams or sequentially vary the orientation of substrate with respect to an ion beam. We also periodically change either the azimuthal or polar angle of the substrate with respect to an ion beam during IBS. These unconventional ways of IBS can improve the order of the pattern, and produce novel and non trivial nano patterns that well serve as touch stones to refine the theoretical models and thus deepen our understanding of the patterning mechanisms by IBS.
ISSN:0953-8984
1361-648X
DOI:10.1088/1361-648X/aac7d7