Highly uniform and symmetric epitaxial InAs quantum dots embedded inside Indium droplet etched nanoholes

• Published in: Nanotechnology 2019-11, Vol.30 (48), p.485001-485001
• Main Authors: Yu, Ying, Zhong, Hancheng, Yang, Jiawei, Liu, Lin, Liu, Jin, Yu, Siyuan
• Format: Article
• Language: English
• Subjects: droplet etched nanoholes; entangled photon pairs; molecular beam epitaxy; symmetric quantum dots
• ISSN: 0957-4484; 1361-6528
• DOI: 10.1088/1361-6528/ab3efb

III−V semiconductor quantum dots (QDs) obtained by local droplet etching technology provide a material platform for generation of non-classic light. However, using this technique to fabricate single emitters for a broad spectral range remains a significant challenge. Herein, we successfully extend the QD emission wavelength to 850-880 nm via highly uniform and symmetric InAs QDs located inside indium-droplet-etching nanoholes. The evolution of InGaAs nanostructures by high temperature indium droplet epitaxy on GaAs substrate is revealed. By carefully designing the appropriate growth conditions, symmetric QDs with the a small fine structure splitting of only ∼4.4 0.8 eV are demonstrated. Averaging over the emission energies of 32 QDs, an ensemble broadening of 12 meV is observed. Individual QDs are shown to emit nonclassically with clear evidence of photon antibunching. These highly uniform and symmetric nanostructures represent a very promising novel strategy for quantum information applications.