Effective suppression of nanotextured black silicon surface recombination channels by aluminum oxide: comparison from sputtered and ALD grown films

Saved in:
Bibliographic Details
Published in:Semiconductor science and technology 2021-11, Vol.36 (11), p.115013
Main Authors: Parashar, Piyush K, Kinnunen, S A, Sajavaara, T, Toppari, J Jussi, Komarala, Vamsi K
Format: Article
Language:English
Subjects:
aluminum oxide
atomic layer deposition
nano-textured silicon
sputtering
surface defect states
surface passivation
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0268-1242
1361-6641
DOI:10.1088/1361-6641/ac2124