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Growth mechanisms of hBN crystalline nanostructures with rf sputtering deposition: challenges, opportunities, and future perspectives
Most hBN nanostructures were fabricated using the chemical method. However, growing by the physical method also has many advantages, they are easy to synthesize this material on a large area with up- scaling setups. Even two-dimensional hexagonal boron nitride is similar to graphene structure, howev...
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Published in: | Physica scripta 2023-04, Vol.98 (4), p.42001 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Most hBN nanostructures were fabricated using the chemical method. However, growing by the physical method also has many advantages, they are easy to synthesize this material on a large area with up- scaling setups. Even two-dimensional hexagonal boron nitride is similar to graphene structure, however there is a little work referring to the fabrication process of this material. Hence, a sufficiently detailed report on physically fabricated hBN materials is essential. This review analyzes the results that we have studied over the past ten years with the synthesis and fabrication of this material using physical vapor deposition - RF sputtering, incorporation with other techniques, strongly emphasized on growth mechanisms of this material. |
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ISSN: | 0031-8949 1402-4896 |
DOI: | 10.1088/1402-4896/acbe7b |