The application of Cu/SiO 2 catalytic system in chemical mechanical planarization based on the stability of SiO 2 sol

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Bibliographic Details
Published in:Journal of semiconductors 2014-06, Vol.35 (6), p.66002
Main Authors: Li, Yan, Liu, Yuling, Wang, Aochen, Yang, Zhixin, Sun, Mingbin, Cheng, Chuan, Zhang, Yufeng, Zhang, Nannan
Format: Article
Language:English
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ISSN:1674-4926
DOI:10.1088/1674-4926/35/6/066002