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Development & characterization of hydrogen reservoirs for thyratrons and copper vapor laser system
The hydrogen reservoir is a critical component of gas filled devices where hydrogen environment is a basic requirement. It maintains equilibrium of hydrogen pressure of the order of 30- 100 Pa at a given temperature in side the gas filled devices. A class of materials, which could absorb hydrogen ga...
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Published in: | Journal of physics. Conference series 2008-05, Vol.114 (1), p.012033 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Online Access: | Get full text |
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Summary: | The hydrogen reservoir is a critical component of gas filled devices where hydrogen environment is a basic requirement. It maintains equilibrium of hydrogen pressure of the order of 30- 100 Pa at a given temperature in side the gas filled devices. A class of materials, which could absorb hydrogen gas under certain temperature condition and then release the hydrogen to maintain its equilibrium pressure at the given temperature. A known family of transition elements like titanium, zirconium, lanthanum etc possesses this property. Among these, titanium is the most suitable material for its gettering properties of hydrogen. A special purpose Hydrogen reservoir has been developed for thyratron and copper vapor laser system. This paper describes the critical steps of fabrication of reservoir and its characterization. The fabrication process mainly depends on the specific size of the reservoir, gas loading process and its end use. The size of the reservoir also depends on the volume of the thyratron and copper vapor laser system in which it is to be used. The amount of gas loaded in the reservoir depends on the volume of the thyratron and temperature of the reservoir. Reservoir characteristics have been studied for the calculated amount of hydrogen gas loading. Behavior for pressure v/s heater power has been studied at different gas loadings. A study of the gas released at high temperature and gas absorbed at room temperature has also been presented in this paper. |
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ISSN: | 1742-6596 1742-6588 1742-6596 |
DOI: | 10.1088/1742-6596/114/1/012033 |