Features of vanadium dioxide films deposition by reactive magnetron sputtering

In this work, influence of substrate material and technological process parameters on the stoichiometric composition, crystal structure and phase transition character in vanadium oxide films deposited by the magnetron sputtering method is investigated.

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Bibliographic Details
Published in:Journal of physics. Conference series 2019-09, Vol.1313 (1), p.12034
Main Authors: Komlev, A E, Shutova, E S, Sypko, M P
Format: Article
Language:English
Subjects:
Crystal structure
Magnetron sputtering
Oxide coatings
Phase transitions
Photovoltaic cells
Physics
Process parameters
Substrates
Vanadium dioxide
Vanadium oxides
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Description
Summary:In this work, influence of substrate material and technological process parameters on the stoichiometric composition, crystal structure and phase transition character in vanadium oxide films deposited by the magnetron sputtering method is investigated.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/1313/1/012034