Study on charge neutralization effect by electron cyclotron resonance plasma source in high vacuum

Electric charge deposition is cause of failures in a variety of in-vacuum manufacturing processes. Therefore, high efficient charge neutralization method is required. The goal of our study is to improve the charge neutralization speed in vacuum. Our research aims to the application of an electron cy...

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Bibliographic Details
Published in:Journal of physics. Conference series 2019-10, Vol.1322 (1), p.12018
Main Authors: Morishita, T, Koda, D, Hosoda, S, Mogami, T, Minemura, K, Nomura, N, Kuninaka, H
Format: Article
Language:English
Subjects:
Charge deposition
Charging
Cyclotron resonance
Electron cyclotron resonance
Flow velocity
Gas flow
High vacuum
Ion thrusters
Physics
Xenon
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Summary:Electric charge deposition is cause of failures in a variety of in-vacuum manufacturing processes. Therefore, high efficient charge neutralization method is required. The goal of our study is to improve the charge neutralization speed in vacuum. Our research aims to the application of an electron cyclotron resonance(ECR) plasma source as neutralizer in vacuum. ECR neutralizer has been developed to neutralize ions emitted by ion thrusters, preventing the spacecraft from charging. We improved the neutralization current and investigated the charge neutralization of insulating film as an application for roll-to-roll system. Conveying films at high speed in vacuum, the films are entangled with each other because of friction charging. By placing the ECR neutralizer at 1.5m from a roll-to-roll system, we can convey the film roll at 1000m/min, the highest speed currently used in the industry. Our neutralization system runs at a gas flow rate of just 0.05mg/s of xenon. The 10W class ECR neutralizer is hence proved to be an effective charge neutralization method also for non-propulsion applications in high vacuum.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/1322/1/012018