Mechanical scanning probe lithography of nanophotonic devices based on multilayer TMDCs

In this work, we demonstrate the possibility of using mechanical Scanning probe lithography (m-SPL) for fabricating nanophotonic devices based on multilayered transition metal dichalcogenides (TMDCs). By m-SPM, we created a nanophotonic resonator from a 70-nm thick MoSe 2 flake transferred on Si/Au...

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Bibliographic Details
Published in:Journal of physics. Conference series 2021-11, Vol.2015 (1), p.12020
Main Authors: Borodin, B R, Benimetskiy, F A, Davydov, V Yu, Eliseyev, I A, Lepeshov, S I, Bogdanov, A A, Alekseev, P A
Format: Article
Language:English
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Summary:In this work, we demonstrate the possibility of using mechanical Scanning probe lithography (m-SPL) for fabricating nanophotonic devices based on multilayered transition metal dichalcogenides (TMDCs). By m-SPM, we created a nanophotonic resonator from a 70-nm thick MoSe 2 flake transferred on Si/Au substrate. The optical properties of the created structure were investigated by measuring microphotoluminescence. The resonator exhibits four resonance PL peaks shifted in the long-wavelength area from the flake PL peak. Thus, here we demonstrate that m-SPL is a high-precision lithography method suitable for creating nanophotonic devices based on multilayered TMDCs.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/2015/1/012020