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Geophysical and Hydrochemical Characteristics of Groundwater at Kerian Irrigation Scheme
.A study was conducted to determine the potential of groundwater uses at the Kerian irrigation scheme, specifically the Selinsing irrigation area. Resistivity image profiling method was employed at four sampling locations within the study area to identify the depth and variation of aquifer layer and...
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Published in: | IOP conference series. Materials Science and Engineering 2016-07, Vol.136 (1), p.12070-12083 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | .A study was conducted to determine the potential of groundwater uses at the Kerian irrigation scheme, specifically the Selinsing irrigation area. Resistivity image profiling method was employed at four sampling locations within the study area to identify the depth and variation of aquifer layer and the possibility of hard layer presence. Investigations conducted revealed that the thickness of aquifer within the study area varies between 5 m and 10 m, which is located at a depth of 30 m to 70 m below the ground surface. The thickness of clay layer is between 1 m and 80 m which dominates the upper subsurface layer. Seven samples of groundwater were used in determining their hydrochemical and physicochemical characteristics, ionic composition, and the quality suitability for irrigation use. A preliminary characterisation based on the piper diagram provides the hydrofacies classification while Stiff diagram is used to exhibit the ionic relationship. The degree of correlation between cations and anions has been estimated in order to assess their mutual relationships. Strong positive correlation exists for Ca2+-Mg2+, Ca2+-Na+, Na+-Mg2+, Na+-K+, Ca2+-K+, Mg2+-K+, Mg2+-Cl-, K+-HCO3-, and Na+-Cl-. Profusion of elements also reflects the composition of aquifer and the climatic conditions, which possibly contribute to the genetic relationship. |
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ISSN: | 1757-8981 1757-899X |
DOI: | 10.1088/1757-899X/136/1/012070 |