Analysis of humidity influence on adhesion and tribological properties of niobium nitride thin films

• Published in: IOP conference series. Materials Science and Engineering 2019-04, Vol.499 (1), p.12006
• Main Authors: Șerdean, F, Pustan, M, Merie, V, Bîrleanu, C, Crișan, H
• Format: Article
• Language: English
• Subjects: Adhesion; Atomic force microscopes; Atomic force microscopy; Coefficient of friction; Direct current; Humidity; Magnetron sputtering; Mechanical properties; Microscopes; Niobium nitride; Relative humidity; Room temperature; Silicon substrates; Thin films; Tribology
• ISSN: 1757-8981; 1757-899X; 1757-899X
• DOI: 10.1088/1757-899X/499/1/012006

This paper is focused on characterizing several samples of niobium nitride thin films using an atomic force microscope at different humidity levels. The samples were deposited by direct current reactive magnetron sputtering on silicon substrates by varying the deposition temperature from room temperature up to 400 °C. The main objective of this paper is to investigate the influence of the humidity level on the adhesion force and on the tribological properties for this type of thin films. Hence, the relative humidity was ranged between 30 % and 80 % and the adhesion force between the AFM tip and each sample was experimentally determined using the spectroscopy in point mode of the AFM. Also, the friction force was determined, and then, based on its experimental values as well as on the values obtained for the adhesion force, the friction coefficient between the AFM tip and the sample was computed. The results obtained from the conducted experimental investigations allow establishing the niobium nitride thin films which have superior properties with respect to adhesion and tribology.