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Gate tunable magneto-resistance of ultra-thin W Te 2 devices

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Bibliographic Details
Published in:2d materials 2017-03, Vol.4 (2), p.21018
Main Authors: Liu, Xin, Zhang, Zhiran, Cai, Chaoyi, Tian, Shibing, Kushwaha, Satya, Lu, Hong, Taniguchi, Takashi, Watanabe, Kenji, Cava, Robert J, Jia, Shuang, Chen, Jian-Hao
Format: Article
Language:English
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ISSN:2053-1583
2053-1583
DOI:10.1088/2053-1583/aa613b