Experimental study on the effect of H 2 O and O 2 on the degradation of SF 6 by pulsed dielectric barrier discharge

• Published in: Plasma science & technology 2024-02, Vol.26 (2), p.25506
• Main Authors: LI 李, Yalong 亚龙, WAN 万, Kun 昆, WANG 王, Yufei 宇非, ZHANG 张, Xiaoxing 晓星, YANG 杨, Zhaodi 照迪, FU 傅, Mingli 明利, ZHUO 卓, Ran 然, WANG 王, Dibo 邸博
• Format: Article
• Language: English
• ISSN: 1009-0630
• DOI: 10.1088/2058-6272/ad0d50

SF 6 has excellent insulation performance and arc extinguishing ability, and is widely used in the power industry. However, its global warming potential is about 23,500 times that of CO 2 , it can exist stably in the atmosphere, it is not easily degradable and is of great potential harm to the environment. Based on pulsed dielectric barrier discharge plasma technology, the effects of H 2 O and O 2 on the degradation of SF 6 were studied. Studies have shown that H 2 O can effectively promote the decomposition of SF 6 and improve its degradation rate and energy efficiency of degradation. Under the action of a pulse input voltage and input frequency of 15 kV and 15 kHz, respectively, when H 2 O is added alone the effect of 1% H 2 O is the best, and the rate and energy efficiency of degradation of SF 6 reach their maximum values, which are 91.9% and 8.25 g kWh −1 , respectively. The synergistic effect of H 2 O and O 2 on the degradation of SF 6 was similar to that of H 2 O. When the concentration of H 2 O and O 2 was 1%, the system obtained the best rate and energy efficiency of degradation, namely 89.7% and 8.05 g kWh −1 , respectively. At the same time, different external gases exhibit different capabilities to regulate decomposition products. The addition of H 2 O can effectively improve the selectivity of SO 2 . Under the synergistic effect of H 2 O and O 2 , with increase in O 2 concentration the degradation products gradually transformed into SO 2 F 2 . From the perspective of harmless treatment of the degradation products of SF 6 , the addition of O 2 during the SF 6 degradation process should be avoided.