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Point defects and dopant diffusion in silicon

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Bibliographic Details
Published in:Reviews of modern physics 1989-04, Vol.61 (2), p.289-384
Main Authors: FAHEY, P. M, GRIFFIN, P. B, PLUMMER, J. D
Format: Article
Language:English
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ISSN:0034-6861
1539-0756
DOI:10.1103/revmodphys.61.289